• 专利标题:   Preparation of macro-graphene quantum dot by dispersing nano-metal catalyst, coating into substrate, drying, curing, placing into chemical vapor deposition system, performing gas reduction, dispersing, and reacting with carbon source.
  • 专利号:   CN104787756-A
  • 发明人:   FENG W, WANG Z, YANG L, ZHANG J
  • 专利权人:   UNIV SHANGHAI
  • 国际专利分类:   C01B031/04
  • 专利详细信息:   CN104787756-A 22 Jul 2015 C01B-031/04 201581 Pages: 8 Chinese
  • 申请详细信息:   CN104787756-A CN10160014 07 Apr 2015
  • 优先权号:   CN10160014

▎ 摘  要

NOVELTY - Preparation of macro-graphene quantum dot includes dispersing nano-metal catalyst to obtain nano-metal catalyst dispersion; coating into substrate, drying, and curing to obtain thin film-coated substrate; placing into chemical vapor deposition system, performing gas reduction, taking out substrate, and dispersing in dispersant; passing through chemical vapor deposition system with carbon source and reduction gas, loading step C substrate, and reacting; and cooling, taking out, etching in nano-metal etching solution, separating, and purifying. USE - Method for preparation of macro-graphene quantum dot (claimed). ADVANTAGE - The method precisely controls graphene quantum dot size, increases graphene quantum dot yield, and has reduced cost. DETAILED DESCRIPTION - Preparation of macro-graphene quantum dot comprises: (A) dispersing 2-100 nm nano-metal catalyst to obtain 0.01-30 wt.% nano-metal catalyst dispersion; (B) coating into substrate, drying, and curing to obtain thin film-coated substrate; (C) placing into chemical vapor deposition system, performing gas reduction at 300-1100 degrees C, taking out substrate, and dispersing in dispersant to uniformly distribute nano-metal catalyst particles into substrate; (D) passing through chemical vapor deposition system with carbon source and reduction gas at 300-1100 degrees C, loading step C product, and reacting to obtain graphene quantum dot with 1-5 single atomic layer; and (E) cooling to room temperature, taking out substrate, etching in nano-metal etching solution until metal catalyst particles are completely dissolved, separating, and purifying.