▎ 摘　　要

NOVELTY - Silicon-doped graphene quantum dot preparation involves placing 10 ml 98% sulfuric acid and 1 g phosphorus pentoxide in a round bottom flask with stirring at 80 degrees C, slowly adding 2 g graphite powder at 80 degrees C for 6 hours, and then cooling at room temperature. The graphite powder is diluted with distilled water, filtered and repeatedly washed, and dried under nitrogen protection. 6 g potassium permanganate powder is slowly added to 46 ml 98% sulfuric acid and graphite powder under ice bath conditions at 20 degrees C with stirring for 4 hours to form a brown paste. 100 ml distilled water and 12 ml analytically pure hydrogen peroxide are added dropwise to give bright yellow liquid, which is filtered, rinsed with distilled water, and then dried in a vacuum to obtain graphene oxide solid. USE - Method for preparing silicon-doped graphene quantum dot. ADVANTAGE - The method prepares the silicon-doped graphene quantum dot in a simple, cost-effective and eco-friendly manner with controllable morphology, uniform particle size dispersion and stable fluorescence performance. DETAILED DESCRIPTION - The obtained graphene oxide solid is added with water to prepare a graphene oxide solution. 0.01-1.5 g silicon source and 10 ml graphene oxide are added in the obtained mixture in 20-200 ml polytetrafluoroethylene in a stainless steel reactor to, perform hydrothermal reaction at 120-200 degrees C for 4-8 hours. The reaction mixture is filtered and freeze-dried to give the silicon-doped graphene quantum dots. The silicon source is silicic acid, sodium silicate, silicon dioxide, and ethyl orthosilicate. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic Transmission electron microscopic of the prepared silicon-doped graphene quantum dot.