• 专利标题:   Semiconductor comprises tungsten oxyselenide (TOS) p-type dopant, where TOS is formed by introducing layer of TOS to semiconductor, and oxidizing layer of WSe to produce TOS layer.
  • 专利号:   US2021328021-A1
  • 发明人:   BORAH A, JUNG Y, CHOI M, NIPANE A B, TEHERANI J T, HONE J
  • 专利权人:   UNIV COLUMBIA NEW YORK
  • 国际专利分类:   H01L051/00, H01L021/385, H01L021/04, H01L029/24, H01L029/16, H01L029/167
  • 专利详细信息:   US2021328021-A1 21 Oct 2021 H01L-029/167 202195 English
  • 申请详细信息:   US2021328021-A1 US236404 21 Apr 2021
  • 优先权号:   US013278P, US236404

▎ 摘  要

NOVELTY - A semiconductor comprises a tungsten oxyselenide (TOS) p-type dopant. USE - Semiconductor e.g. one-dimensional semiconductor, two-dimensional semiconductor, or three-dimensional semiconductor including graphene, carbon nanotube, tetralayer tungsten diselenide, or dinaphthothienothiophene (all claimed) for organic semiconductor device used in photonic applications for telecommunications including transparent gate electrode near optical waveguides, and high-speed phase-modulator for infrared photonics. ADVANTAGE - The method enables creating stable doping patterns on a variety of semiconductor materials which reduce damage or defects on the resultant material. The method provides for the oxidation of tungsten diselenide to TOS without damaging underlying semiconductor layers. The resultant doping material can remain stable and operate effectively at low temperatures (e.g. 1.5 K). The doping can be stable for over a month, which can be useful for the creation of reliable semiconductor devices. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for doping of semiconductor.