▎ 摘　　要

NOVELTY - Realization of longitudinal and transverse graphene controlled preparation in plasma enhanced chemical vapor deposition comprising orderly using ethanol, acetone and isopropanol to clean the glass substrate, using argon gas blowing to dry the glass substrate after cleaning, adding the glass substrate in a Faraday cage and the faraday cage coating of the glass substrate in PECVD cavity inside, heating substrate, adding argon gas, methane and hydrogen to generate plasma, growing, closing the plasma generating source. USE - The method is useful for realization of longitudinal and transverse graphene controlled preparation in plasma enhanced chemical vapor deposition (claimed). DETAILED DESCRIPTION - Realization of longitudinal and transverse graphene controlled preparation in plasma enhanced chemical vapor deposition comprising orderly using ethanol, acetone and isopropanol to clean the glass substrate, using argon gas blowing to dry the glass substrate after cleaning, (ii) adding the glass substrate in a Faraday cage and the faraday cage coating of the glass substrate in PECVD cavity inside, heating substrate to 540-580 degrees C, (iii) adding argon gas, methane and hydrogen to generate plasma, growing for 60-120 minutes, (iv) closing the plasma generating source, naturally reducing the temperature to below 50 degrees C under the protection of argon atmosphere, to obtain graphene glass sample.