▎ 摘　　要

NOVELTY - Graphene preparing device comprises a hollow cavity. The hollow cavity from outer to inner orderly is set with cavity layer (11), insulating layer (12) and inner layer (13). The other side of hollow cavity of the hollow cavity is provided with an inlet flange (9) along one side of the transverse axis of the corresponding with the air inlet flange is provided with an exhaust flange (10). The hollow cavity is set with the exhaust flange located perpendicular to the surface connected with a feeding door. The outer cavity is set between the feeding doors is provided with a copper gasket. The interior of the hollow cavity is provided with corresponding upper worktable and the lower workbench along the longitudinal axis. The upper working table is provided with a heater B and through the upper worktable adjusting mechanism and the hollow cavity inner wall. The upper working table along the surface of the lower worktable is provided with a clamp. USE - Used as graphene preparing device. ADVANTAGE - The device and preparation process is simply graphene functional material and mass production of the device. DETAILED DESCRIPTION - Graphene preparing device comprises a hollow cavity. The hollow cavity from outer to inner orderly is set with cavity layer (11), insulating layer (12) and inner layer (13). The other side of hollow cavity of the hollow cavity is provided with an inlet flange (9) along one side of the transverse axis of the corresponding with the air inlet flange is provided with an exhaust flange (10). The hollow cavity is set with the exhaust flange located perpendicular to the surface connected with a feeding door. The outer cavity is set between the feeding doors is provided with a copper gasket. The interior of the hollow cavity is provided with corresponding upper worktable and the lower workbench along the longitudinal axis. The upper working table is provided with a heater B and through the upper worktable adjusting mechanism and the hollow cavity inner wall. The upper working table along the surface of the lower worktable is provided with a clamp. The lower workbench inner part is provided with a heater A, and connected through the lower workbench stent and the hollow cavity inner wall. The cavity insulating layer and the lower workbench stent corresponding to the hollow cavity of the cavity in the insulating layer and the hollow cavity corresponding with upper worktable adjusting mechanism are set with heater. An INDEPENDENT CLAIM is also included for pattern growing graphene using the graphene preparing device, comprising (i) opening the feeding door, placing the carrier sheet surface level on the lower working table, dropping the liquid metal on the carrier sheet, (ii) inserting a graphene growth substrate in the upper space of the clamp, fixed by the upper mechanism of the clamp, inserting a patterned mask template in the lower space of the clamp, fixing by the lower mechanism of the clamp, (iii) closing the injection door, vacuuming the stellene growth device and charging the inert gas, maintaining gas pressure at 0.1-1 atm, (iv) separately controlling the temperature of the heater A, the heater B, and the heater C to maintain the temperature between room temperature to 1200 degrees C, (v) introducing a carbon source or a mixture of a carbon source and hydrogen into the graphene growth device for growth for 5-90 minutes, the carbon source is at least one of methane, ethylene, and acetylene, and (vi) stopping heating, cooling to room temperature under vacuum state, or introducing argon to cooling to room temperature. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic representation of the graphene preparing device. Inlet flange (9) Exhaust flange (10) Cavity layer (11) Insulating layer (12) Inner layer (13)