• 专利标题:   Graphic graphene preparation method, involves producing windows, separating optical resist or graphene from poly methyl methacrylate layer, and obtaining graphic graphene on device substrate.
  • 专利号:   CN101872120-A, CN101872120-B
  • 发明人:   DAI Y, QIN G, DAI L, YE Y
  • 专利权人:   UNIV PEKING
  • 国际专利分类:   G03F007/00
  • 专利详细信息:   CN101872120-A 27 Oct 2010 G03F-007/00 201107 Pages: 8 Chinese
  • 申请详细信息:   CN101872120-A CN10215355 01 Jul 2010
  • 优先权号:   CN10215355

▎ 摘  要

NOVELTY - The method involves producing corresponding windows in positions requiring graphene, and covering surfaces except the windows with optical resist or poly methyl methacrylate (PMMA) layer. The graphene and the PMMA layer are adhered with each other and transferred to a device substrate to closely touch the graphene with the substrate at the windows for thermal treatment. The substrate is soaked in acetone solution. The optical resist or graphene on the PMMA layer is separated from the PMMA layer. Graphic graphene is obtained on the device substrate. USE - Graphic graphene preparation method. ADVANTAGE - The method ensures providing accurate graphic graphene locating effect without any corrosion operation and manufacturing an embossing template at low cost. The graphic graphene can be accurately located and devices in a large area can be integrated easily. The step of corroding oxygen ions can be avoided so as to avoid performance reduction of the device caused by radiation damage. DESCRIPTION OF DRAWING(S) - The drawing shows a flowchart illustrating a graphic graphene preparation method. '(Drawing includes non-English language text)'