• 专利标题:   Direct epitaxial growth method of graphene used for fabrication of device, involves using sapphire as substrate, preprocessing sapphire substrate, regulating growth pressure, flow rate and temperature and growing graphene on sapphire.
  • 专利号:   CN102915913-A, CN102915913-B
  • 发明人:   ZHANG J, HAN D, NING J, CHAI Z, YAN Y, WANG D, HAO Y
  • 专利权人:   UNIV XIDIAN
  • 国际专利分类:   H01L021/205
  • 专利详细信息:   CN102915913-A 06 Feb 2013 H01L-021/205 201349 Pages: 7 Chinese
  • 申请详细信息:   CN102915913-A CN10408274 22 Oct 2012
  • 优先权号:   CN10408274

▎ 摘  要

NOVELTY - Sapphire is used as a substrate, the sapphire substrate is preprocessed, and growth pressure, flow rate and temperature are regulated, such that the graphene is directly grow on the sapphire without using metal as catalyst. Thus, direct epitaxial growth method of graphene is carried out. USE - Direct epitaxial growth method of graphene used for fabrication of device (claimed). ADVANTAGE - The method efficiently provides graphene. The fabrication of device is efficiently carried out using the graphene, by a simple process. The fabricated device has excellent electrical characteristics and reliability.