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  • 专利标题:   Patterning graphene with DNA structure, comprises forming DNA pattern and forming graphene on DNA pattern.
  • 专利号:   KR2014010892-A, KR1462903-B1
  • 发明人:   GYU P I, HA P S, HAN N Y, HONG P J, MO Y S, TAEK L J, WON J S, JEONG S, LEE J, PARK I K, PARK J H, PARK S, ROH Y, YEON S
  • 专利权人:   UNIV SUNGKYUNKWAN RES BUSINESS FOUND
  • 国际专利分类:   B41M005/10, C01B031/02
  • 专利详细信息:   KR2014010892-A 27 Jan 2014 C01B-031/02 201415 Pages: 33
  • 申请详细信息:   KR2014010892-A KR082292 12 Jul 2013
  • 优先权号:   KR075840

▎ 摘　　要

NOVELTY - Patterning graphene comprises forming DNA pattern and forming graphene on the DNA pattern. USE - The method is useful for patterning graphene (claimed) with a DNA structure. ADVANTAGE - The method is capable of forming minute pattern of graphene on the DNA structure with uniform width.