• 专利标题:   Graphene composing apparatus used in semiconductor and display industry, has gas discharge portion which is provided for ejecting gas inside chamber.
  • 专利号:   KR1168259-B1
  • 发明人:   KIM S M, LEE H J, KIM J H, KIM K S, LEE S M, JANG B, HWANG B Y, KIM K, CHOI H J, OH C S
  • 专利权人:   KOREA INST MACHINERY MATERIALS
  • 国际专利分类:   B01J019/18, B41M005/03, B41M005/10
  • 专利详细信息:   KR1168259-B1 30 Jul 2012 201313 Pages: 12
  • 申请详细信息:   KR1168259-B1 KR022102 05 Mar 2012
  • 优先权号:   KR022102

▎ 摘  要

NOVELTY - The apparatus (1000) has a supply roll (200) and a recovery roll (300) whose both ends are connected to substrate (700). The supply roll and recovery roll are equipped inside the chamber (100). A heating portion (400) is provided for heating substrate. A gas supply unit (500) is provided supplying gas including carbon to chamber. A gas discharge portion (600) is provided for ejecting the gas inside chamber. A cooling unit is formed to cool the substrate. The side of heating portion is in contact with substrate. USE - Graphene composing apparatus used in semiconductor and display industry. ADVANTAGE - The graphene can be consecutively synthesized in the substrate. The synthetic unit cost of the graphene can be lowered. The productivity of the graphene synthesis can be improved. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of the grapheme composing apparatus. (Drawing includes non-English language text) Chamber (100) Supply roll (200) Recovery roll (300) Heating portion (400) Gas supply unit (500) Gas discharge portion (600) Substrate (700) Graphene composing apparatus (1000)