• 专利标题:   Double-layer graphene electric light modulator manufacturing method, involves performing high temperature annealing process for SOI sheet to obtain micro-ring cavity waveguide and transferring graphene to surface of cavity.
  • 专利号:   CN103869504-A, CN103869504-B
  • 发明人:   CUI D, LIU J, WANG Y, WEI L, XIONG J, XUE C, ZHANG W
  • 专利权人:   UNIV NORTH CHINA
  • 国际专利分类:   G02F001/035
  • 专利详细信息:   CN103869504-A 18 Jun 2014 G02F-001/035 201458 Pages: 8 Chinese
  • 申请详细信息:   CN103869504-A CN10123884 31 Mar 2014
  • 优先权号:   CN10123884

▎ 摘  要

NOVELTY - The method involves designing a light waveguide resonant cavity by simulation anlysis. Qth value is selected as high. A convergent process is performed. Light waveguide resonant cavity is formed on a SOI sheet, where a top surface of the SOI sheet is 220nm, and layer thickness of the SOI sheet is 3 micro meter. High temperature annealing process for the SOI sheet is performed to obtain a SOI base micro-ring cavity waveguide. A graphene is transferred to a surface of the SOI micro-ring resonant cavity by using a SOI FIB device. USE - Double-layer graphene electric light modulator manufacturing method. ADVANTAGE - The method enables manufacturing a double-layer graphene electric light modulator in high speed and low power consumption manner. DESCRIPTION OF DRAWING(S) - The drawing shows a sectional view of a double-layer graphene electric light modulator.