▎ 摘　　要

NOVELTY - Using deposition system involves loading a wafer into a processing chamber equipped with an RF system, supplying an aromatic hydrocarbon precursor into the processing chamber, turning on an RF power of the RF system to decompose the aromatic hydrocarbon precursor into active radicals and produce a graphene layer over a metal layer on the wafer after supplying the aromatic hydrocarbon precursor, and turning off the RF power of the RF system to stop forming the graphene layer after an entirety of the metal layer being covered by the graphene layer. USE - Method for using deposition system. ADVANTAGE - The method provides smaller and more complex circuits, and provides benefits by increasing production efficiency and lowering associated costs. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a deposition system.