• 专利标题:   Graphite substrate useful for manufacturing light emitting diode epitaxial wafer in semiconductor field, comprises graphite disc and multiple annular isolation layer, where surface of graphite disc is provided with multiple grooves for containing epitaxial wafer.
  • 专利号:   CN114108080-A
  • 发明人:   LI P, LU X, XIAO Y, GUO B, DING T, GE Y
  • 专利权人:   HC SEMITEK ZHEJIANG CO LTD
  • 国际专利分类:   C30B023/00, C30B025/12, C30B025/16, C30B029/02, C30B029/06, C30B029/08, C30B029/40, H01L033/00
  • 专利详细信息:   CN114108080-A 01 Mar 2022 C30B-025/12 202226 Chinese
  • 申请详细信息:   CN114108080-A CN11159047 30 Sep 2021
  • 优先权号:   CN11159047

▎ 摘  要

NOVELTY - Graphite substrate comprises a graphite disc and multiple annular isolation layer. The graphite disc is a disc. The surface of the graphite disc is provided with multiple grooves for containing the epitaxial wafer, and each of the groove is provided with the annular isolation layer for supporting the epitaxial wafer. The annular isolating layer is a two-dimensional atomic crystal material layer. The annular isolation layer is a graphene layer, a silicene layer, a germanene layer or a hexagonal boron nitride layer. USE - The graphite substrate is useful for manufacturing light emitting diode epitaxial wafer (claimed) in semiconductor field. ADVANTAGE - The graphite substrate which is used to grow the light emitting diode epitaxial wafer can reduce the uneven heating, improve the wavelength uniformity of the epitaxial wafer, and efficiently reduce the generation of cracks in the epitaxial wafer. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are also included for: (1) a method for manufacturing graphite substrate; and (2) a method for manufacturing light emitting diode epitaxial wafer. DESCRIPTION OF DRAWING(S) - The drawing shows a structure schematic diagram of a graphite substrate. Graphite plate (10) Integrated groove (10a) Annular isolation layer (20)