▎ 摘　　要

NOVELTY - Atomic-level mechanical peeling cleaning of graphene surface comprises taking target substrate, adhering graphene, soaking in organic solvent comprising tetrahydrofuran, toluene, butanone and/or ethyl acetate, and dissolving graphene surface residue. USE - Method for atomic-level mechanical peeling cleaning of graphene surface used for field effect transistor or electric conduction film (claimed). ADVANTAGE - The method maintains initial performance of graphene, maintains high quality, recycles organic solvent and saves energy. It does not pollute the environment. DESCRIPTION OF DRAWING(S) - The drawing shows a process flow diagram of atomic-level mechanical peeling cleaning of graphene surface (Drawing includes non-English language text).