• 专利标题:   Preparing single crystal domain and polycrystalline domain graphene useful in technical field of basic research and graphene, comprises heating graphene film under an air atmosphere and annealing.
  • 专利号:   CN115354385-A
  • 发明人:   ZHENG Q, MA M, HUANG J, YU Z, HE Y
  • 专利权人:   UNIV TSINGHUA, UNIV TSINGHUA RES INST IN SHENZHEN
  • 国际专利分类:   C23C016/02, C23C016/26, C30B001/02, C30B028/02, C30B029/02
  • 专利详细信息:   CN115354385-A 18 Nov 2022 C30B-001/02 202304 Chinese
  • 申请详细信息:   CN115354385-A CN10921391 02 Aug 2022
  • 优先权号:   CN10921391

▎ 摘  要

NOVELTY - Preparing single crystal domain and polycrystalline domain graphene comprises heating graphene film to 130-150℃ under an air atmosphere, and annealing for 5-10 minutes to obtain single-crystal domain and polycrystalline domain graphene. The preparation of graphene film comprises (A) heating substrate at 1030-1050℃ under nitrogen atmosphere for annealing, where the flow rate of nitrogen gas is 200-250 sccm, (B) continue conveying nitrogen, methane and hydrogen, and growing graphene film on substrate, where the flow rate of hydrogen is 18-20 sccm, and the flow rate of methane is 8-10 sccm, and (C) stop conveying methane, and cooling to room temperature to obtain graphene film. The substrate is copper foil. USE - The method is useful for preparing single crystal domain and polycrystalline domain graphene in technical field of basic research and graphene. ADVANTAGE - The method: is simple and easy to control experimental operations; and has easily available raw material. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for single crystal domain and polycrystalline domain graphene, prepared by above method.