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  • 专利标题:   Fabricating graphene loaded polymannose-chitosan based hydrogel scaffolds using Schiff base formation followed by freeze drying technique.
  • 专利号:   IN202241047228-A
  • 发明人:   FRANCIS A P, RENU K, DAKSHINYA, VEERAIYAN D N
  • 专利权人:   UNIV SAVEETHA MEDICAL TECH SCI SAVEETH
  • 国际专利分类:   A61K047/36, A61L027/18, C08B037/08, C08J003/075, G01N033/50
  • 专利详细信息:   IN202241047228-A 26 Aug 2022 C08J-003/075 202296 Pages: 7 English
  • 申请详细信息:   IN202241047228-A IN41047228 19 Aug 2022
  • 优先权号:   IN41047228

▎ 摘　　要

NOVELTY - Fabricating graphene loaded polymannose-chitosan based hydrogel (GPMC) scaffolds using Schiff base formation followed by freeze drying technique, where the gelation time, morphology, wettability and swelling index, and the biocompatibility of the GPMC scaffolds is also evaluated using Flowcytometry. USE - The method is useful for fabricating graphene loaded polymannose-chitosan based hydrogel (GPMC) scaffolds. ADVANTAGE - The method is economical.