▎ 摘　　要

NOVELTY - Detecting defect (104) in sample (102) including graphene, involves receiving sample including at least some graphene and at least some defects in graphene; exposing sample to gas (120) under sufficient reaction conditions to form marked sample (105), where the marked sample includes marks (122) bonded to defects in graphene; at least partially removing gas from marked sample; placing the marked sample in a detector system (131); and detecting the defect by detecting at least some of the marks bonded to defects in the marked sample with the detector system. USE - For detecting defect in sample including graphene (claimed). ADVANTAGE - The process can be carried out in minutes; is reversible process; and provides high sensitivity and high throughput like wafer scale detection without destroying the sample (i.e. non-destructive defect detection). DETAILED DESCRIPTION - Detecting a defect (104) in a sample (102) including graphene, involves receiving a sample, where the sample includes at least some graphene and at least some defects in the graphene; exposing the sample to a gas (120) under sufficient reaction conditions to produce a marked sample (105), where the marked sample includes marks (122) bonded to at least some of the defects in the graphene; at least partially removing the gas from the marked sample; placing the marked sample in a detector system (131); and detecting the defect by detecting at least some of the marks bonded to defects in the marked sample with the detector system. The method further involves exposing the marked sample to a liquid or a gas under sufficient reaction conditions to at least partially remove the marks from the defects of the marked sample; exposing the marked sample to heat under sufficient reaction conditions to at least partially remove the marks from the defects of the marked sample; and exposing the marked sample at 100-200 degrees C in a pressure of 0.5-10 millitorr to at least partially remove the marks from the defects of the marked sample. INDEPENDENT CLAIMS are included for the following: (1) a system effective to detect a defect in a sample, comprising a chamber configured effective to receive a sample, where the chamber is effective to expose the sample to a gas under sufficient reaction conditions to produce a marked sample, where the marked sample includes graphene and marks bonded to at least some of the defects associated with the sample, the chamber further effective to at least partially remove the gas from the marked sample; and a detector system configured in operative relationship with the chamber, where the detector system is configured effective to receive the marked sample and effective to detect at least some of the marks bonded to defects in the marked sample; and (2) a sample comprising at least some graphene, at least one defect in the graphene, and at least one mark bonded to at least one of the defects, where the mark includes molecules, and the molecules include at least one atom having an atomic weight greater than 40 the mark effective to facilitate detection of the defect. DESCRIPTION OF DRAWING(S) - The figure shows a schematic view of a system that can be utilized to implement graphene defect detection. Sample (102) Defect (104) Marked sample (105) Gas (120) Marks (122) Detector system (131)