▎ 摘　　要

NOVELTY - The method involves forming a groove on a substrate to form a required image via deep reaction ion etching, micro cutting technique and wet corroding technique, where depth and width ratio of the groove is greater than 1.1. Large area graphene film is prepared. The graphene film is moved in solution. The large area graphene film is transferred to the imaged substrate with groove from the solution. The substrate and graphene are dryed. The graphene in the groove area is boken via a surface tension of the solution to obtain the required imaged graphene. USE - Graphene imaging method. ADVANTAGE - The method enables accurately determining a position of the imaged graphene on the substrate without performing photolithography on the graphene so as to avoid damaging of crystal lattice quality of the graphene. The method enables performing graphene imaging process at low cost. The method enables easily positioning the graphene without pollution. DETAILED DESCRIPTION - The substrate is silicon piece, monox piece, ceramic, and glass piece. The solution is deionized water, alcohol, acetone, carbontetrachloride and isopropanol. DESCRIPTION OF DRAWING(S) - The drawing shows a flow diagram illustrating a graphene imaging method.'(Drawing includes non-English language text)'