• 专利标题:   Two-dimensional material forming apparatus comprises substrate moving unit, and two-dimensional material forming unit for forming two-dimensional material by spraying carbon gas on substrate moved by substrate moving unit.
  • 专利号:   KR2021114241-A
  • 发明人:   SHIN U C
  • 专利权人:   SHIN U C
  • 国际专利分类:   C23C016/26, C01B032/186, C23C016/02, C23C016/455, C23C016/458, C23C016/50, C23C016/54
  • 专利详细信息:   KR2021114241-A 23 Sep 2021 C23C-016/26 202186 Pages: 13
  • 申请详细信息:   KR2021114241-A KR029682 10 Mar 2020
  • 优先权号:   KR029682

▎ 摘  要

NOVELTY - A two-dimensional (2D) material forming apparatus comprises a substrate moving unit for moving the substrate, and a 2D material forming unit for forming the 2D material by spraying carbon gas on the substrate moved by the substrate moving unit. USE - Two-dimensional material forming apparatus. ADVANTAGE - The 2D material forming apparatus enables uniform and mass production of two-dimensional materials such as graphene for all areas of the substrate e.g. flexible substrates, due to the unique structure of the substrate moving unit and the 2D material forming unit.