▎ 摘　　要

NOVELTY - Photoresist pigment paste comprises 5-10 pts. wt. acrylic resin, 5-50 pts. wt. pre-processing pigment, 1-5 pts. wt. wetting dispersant, 50-75 pts. wt. propylene glycol methyl ether acetate and 0.1-5 pts. wt. butyl acetate. USE - The photoresist pigment paste is useful in liquid crystal display materials. ADVANTAGE - The photoresist pigment paste has excellent stability and good pigment dispersibility. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for preparing photoresist pigment paste, comprising (i) mixing the graphene oxide aqueous solution with N,N-dimethylformamide and feeding into the spinning separator together with heated inert gas for spray drying to obtain modified graphene blanks; (ii) heating the modified graphene blank, reducing in an inert gas atmosphere, cooling to room temperature, and discharging to obtain modified graphene; (iii) heating and melting the paraffin wax, mixing with the initiator, adding styrene, heating and stirring under inert gas conditions to obtain pretreated paraffin wax, mixing the pretreated paraffin wax with the maleic anhydride mixed dispersion, stirring the reaction in an air atmosphere, distilling, recycling organic solvents to obtain modified paraffin blanks, condensing the modified paraffins, crushing, granulating and sieving to obtain modified paraffins; (iv) mixing the modified paraffin obtained in step (iii) with the modified graphene obtained in step (ii), adding the pigment, stirring, mixing, heating to melt the paraffin, stirring continuously to obtain a pretreated pigment blank, cooling the pretreated pigment blank, crushing and sieving to obtain pre-treated pigments; and (v) taking 10 pts. wt. acrylic resin, 30 pts. wt. pretreated pigment, 5 pts. wt. wetting and dispersing agent, 60 pts. wt. propylene glycol methyl ether acetate and 5 pts. wt. n-butyl acetate, mixing propylene glycol methyl ether acetate and n-butyl acetate, adding acrylic resin, pretreatment pigment and wetting and dispersing agent, stirring and mixing.