▎ 摘　　要

NOVELTY - Preparation of graphene wafer involves activating a substrate, in which graphene wafer is to-be-deposited, controlling the thickness of graphene by an ion-implantation process, contacting the substrate with the surface of the graphite, and applying an external physical field to peel the graphene wafer from the surface of the graphite material and deposit the graphene wafer onto the surface of the substrate. USE - Preparation of graphene wafer. ADVANTAGE - A high quality graphene is produced on substrate by simple method with improved reproducibility. The thickness and size of the prepared graphene wafer are controlled easily.