• 专利标题:   Manufacturing method of transparent conductive layer, involves etching graphene layer to form grid pattern.
  • 专利号:   CN102568657-A
  • 发明人:   CHEN J, HU G, JIANG M, LIAO J, LIN Y, QIU B
  • 专利权人:   AU OPTRONICS CORP
  • 国际专利分类:   H01B013/00, H01B005/14
  • 专利详细信息:   CN102568657-A 11 Jul 2012 H01B-005/14 201259 Pages: 7 Chinese
  • 申请详细信息:   CN102568657-A CN10041075 21 Feb 2012
  • 优先权号:   CN10041075

▎ 摘  要

NOVELTY - The method involves forming the metal layer which is deposited with graphene layer on the metal layer. The graphene layer is etched to form a grid pattern. A substrate is provided to transfer the graphene on the substrate. The metal layer is provided with a copper metal layer or nickel metal layer. USE - Manufacturing method of transparent conductive layer. ADVANTAGE - Since the resistance value of the conductive layer can be reduced, the transmittance of conductive layer can be improved. The penetration rate of the transparent conductive layer can be increased. DESCRIPTION OF DRAWING(S) - The drawing shows a flow diagram illustrating the process for manufacturing transparent conductive layer. (Drawing includes non-English language text)