• 专利标题:   Insulation gate FET, has graphene conductive layer formed with gate oxide layer and semi-conductor layer, where semi-conductor layer is formed with channel area and cell area.
  • 专利号:   CN103872101-A, CN103872101-B
  • 发明人:   ZHU W, HU A, LU S, ZHU Y
  • 专利权人:   JIANGSU INTERNET THINGS RES DEV CENT, INST MICROELECTRONICS CHINESE ACAD SCI, JIANGSU ZHONGKE JUN CORE TECHNOLOGY CO, INST MICROELECTRONICS CHINESE ACAD SCI, JIANGSU INTERNET THINGS RES DEV CENT, CHINESE ACAD SCI JIANGSU IGBT TECHNOLOGY
  • 国际专利分类:   H01L021/28, H01L021/336, H01L029/423, H01L029/78
  • 专利详细信息:   CN103872101-A 18 Jun 2014 H01L-029/423 201456 Pages: 9 Chinese
  • 申请详细信息:   CN103872101-A CN10551729 18 Dec 2012
  • 优先权号:   CN10551729

▎ 摘  要

NOVELTY - The FET has a graphene conductive layer formed with a gate oxide layer and a semi-conductor layer. The semi-conductor layer is formed with a channel area and a cell area. USE - Insulation gate FET. ADVANTAGE - The FET reduces power consumption and occupies less space. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for an insulation gate FET manufacturing method. DESCRIPTION OF DRAWING(S) - The drawing shows a flow diagram illustrating an insulation gate FET manufacturing method.'(Drawing includes non-English language text)'