▎ 摘　　要

NOVELTY - Preparing active graphene material comprises dipping graphene in potassium hydroxide alkali solution, stirring the mixture, then ultra-sounding and standing, transferring the mixture to a hydrothermal kettle, placing the transferred mixture in a muffle furnace, raising the temperature of the mixture and then holding, cooling the mixture to room temperature, filtering the cooled mixture, washing filtered product using residual alkali solution and acid, removing alkaline solution of residue, and drying obtained product in a blast drying box in a blast drying box. USE - The method is useful for preparing active graphene material (claimed). ADVANTAGE - The method is capable of simply preparing the active graphene material with reduced reaction temperature, shortened reaction time, high yield of more than 80%, hole diameter distribute uniformity of 3-10 nm and increased photoelectric conversion efficiency of 36%. DETAILED DESCRIPTION - Preparing active graphene material comprises dipping graphene in 0.5-1.5 g of potassium hydroxide alkali solution, stirring the mixture for 2-6 hours, then ultra-sounding for 1-4 hours and standing for 12-48 hours, transferring the mixture to a hydrothermal kettle, placing the transferred mixture in a muffle furnace, raising the temperature of the mixture to 140-200 degrees C and then holding for 0.5-2 hours, cooling the mixture to room temperature, filtering the cooled mixture, washing filtered product using residual alkali solution and acid, removing alkaline solution of residue, again filtering and washing with water, and drying obtained product at 40-60 degrees C for 3-5 hours, in a blast drying box.