• 专利标题:   Growing three-dimensional nitrogen-doped graphene by taking nano-pore graphene as substrate comprises dispersing graphene oxide in dispersing agent and pore forming agent to obtain dispersion, carbonizing, activating, heating and cooling.
  • 专利号:   CN104925794-A, CN104925794-B
  • 发明人:   XIA J, ZHANG F, WANG Z, YANG M, ZHAO Q
  • 专利权人:   UNIV QINGDAO
  • 国际专利分类:   B82Y040/00, C01B031/04
  • 专利详细信息:   CN104925794-A 23 Sep 2015 C01B-031/04 201603 Pages: 7 Chinese
  • 申请详细信息:   CN104925794-A CN10320012 11 Jun 2015
  • 优先权号:   CN10320012

▎ 摘  要

NOVELTY - Growing three-dimensional nitrogen-doped graphene by taking nano-pore graphene as substrate comprises (i) adding dispersing agent into graphene oxide and pore forming agent and dispersing to obtain dispersion; (ii) heating the dispersion under protective gas atmosphere to obtain oxidized graphene, carbonizing and pore forming processing to obtain multi- nanopore graphene oxide precursor, where the carbonization temperature is 1500-2500 degrees C, the carbonization time is 30-60 hours and heating rate is 5-10 degrees C/minute; (iii) activating; and (iv) heating and cooling. USE - The method is useful for growing three-dimensional nitrogen-doped graphene by taking nano-pore graphene as substrate (claimed). ADVANTAGE - The method avoids the introduction of an impurity element other than carbon. The nitrogen-doped graphene is 5-50 nm in size, has uniform pore size distribution, good electrochemical properties, and high purity. DETAILED DESCRIPTION - Growing three-dimensional nitrogen-doped graphene by taking nano-pore graphene as substrate comprises (i) adding dispersing agent into graphene oxide and pore forming agent and dispersing to obtain dispersion; (ii) heating the dispersion under protective gas atmosphere to obtain oxidized graphene, carbonizing and pore forming processing to obtain multi- nanopore graphene oxide precursor, where the protective gas flow rate is 50-150 l/hour, the carbonization temperature is 1500-2500 degrees C, the carbonization time is 30-60 hours and heating rate is 5-10 degrees C/minute; (iii) placing the multi- nanopore graphene oxide precursor in plasma gas flow, activating, introducing carbon and nitrogen sources in the plasma gas flow activation process, where the activation temperature is 600-800 degrees C and the activation time is 5-15 minutes, and then stopping the supply of plasma; and (iv) cooling from the activation temperature to 80-120 degrees C, heating at rate of 180-200 degrees C/minutes, incubating for 20-30 hours, cooling to room temperature, and stopping adding of carbon and nitrogen sources, where the heating and cooling rate is 10-20 degrees C/minute.