▎ 摘　　要

NOVELTY - The method involves forming a silver nanowire layer (13) on a graphene film (11) supported by a copper support. A transparent resin layer (14) is formed on the silver nanowire layer such that the transparent resin layer contacts the graphene film through an opening (13b), where the transparent resin layer is insoluble in a copper-etching solution. The copper support is removed by bringing the copper support into contact with a non-acidic copper-etching solution after forming the transparent resin layer to expose the graphene film. USE - Method for manufacturing a transparent conductor in electric devices. Uses include but are not limited to LCD devices, solar cells, organic EL devices and optical sensors. ADVANTAGE - The method enables preventing a transparent conductor from being easily broken. The method enables reducing distortion of the graphene film to avoid increase in electric resistance when depth of a recess is within extent. DETAILED DESCRIPTION - The transparent resin layer comprises a thermosetting resin or a light curing resin. The non-acidic copper-etching solution is basic. The non-acidic copper-etching solution comprises copper (II) chloride (CuCl2), ammonia or an organic amine. INDEPENDENT CLAIMS are also included for the following: (1) a transparent conductor (2) a device for manufacturing a transparent conductor. DESCRIPTION OF DRAWING(S) - The drawing shows a cross-sectional view illustrating a method for manufacturing a transparent conductor. Graphene film (11) Silver nanowire layer (13) Opening (13b) Transparent resin layer (14)