• 专利标题:   Pellicle for extreme ultraviolet exposure, has pellicle layer that is provided with yttrium compound-containing layer containing ytterbium-based compound.
  • 专利号:   KR2022141374-A
  • 发明人:   KIMHYUNGKEUN, KIM S K, MI K H, LIM H M, KIM H Y, JEONJUNHYUCK, LEE S M
  • 专利权人:   KOREA ELECTRONICS TECHNOLOGY INST
  • 国际专利分类:   G03F001/22, G03F001/62
  • 专利详细信息:   KR2022141374-A 20 Oct 2022 G03F-001/62 202296 Pages: 23
  • 申请详细信息:   KR2022141374-A KR047208 12 Apr 2021
  • 优先权号:   KR047208

▎ 摘  要

NOVELTY - A pellicle comprises a pellicle layer having a yttrium compound-containing layer containing a yttrium compound. The yttrium compound includes yttrium trifluoride, yttrium nitride, yttrium oxynitride, yttrium aluminum garnet, monoclinic yttrium aluminate, yttrium aluminum perovskite, yttrium oxyfluoride, yttrium oxycarbide, yttrium orthosilicate or yttrium silicon oxide. USE - Pellicle used in extreme UV exposure device for use in semiconductor device and electronic device. ADVANTAGE - The pellicle has excellent mechanical strength, chemical resistance, thermal stability, mechanical stability and chemical durability, and high extreme UV transmittance of 85% or more. DETAILED DESCRIPTION - A pellicle comprises a pellicle layer having a yttrium compound-containing layer containing a yttrium compound. The yttrium compound includes yttrium trifluoride, yttrium nitride, yttrium oxynitride, yttrium aluminum garnet (Y3Al5O12), monoclinic yttrium aluminate (Y4Al2O9), yttrium aluminum perovskite (YAlO3), yttrium oxyfluoride, yttrium oxycarbide (Y2OC), yttrium orthosilicate (Y2SiO5) or yttrium silicate (Y2Si3O9).