• 专利标题:   Preparation of FET based on narrow graphene nano-belt, comprises preparing graphene nano-belt on substrate with oxide grid medium, and forming metal layer of source electrode and drain electrode at two ends.
  • 专利号:   CN114038756-A, CN114038756-B
  • 发明人:   LI X, HU B, JIANG S, ZHOU Q, WANG K, CHEN C
  • 专利权人:   UNIV SHANGHAI JIAOTONG
  • 国际专利分类:   B82Y010/00, H01L021/336, H01L029/16, H01L029/786
  • 专利详细信息:   CN114038756-A 11 Feb 2022 H01L-021/336 202224 Chinese
  • 申请详细信息:   CN114038756-A CN11311073 08 Nov 2021
  • 优先权号:   CN11311073

▎ 摘  要

NOVELTY - The preparation of FET based on narrow graphene nano-belt comprises preparing graphene nano-belt on a substrate with an oxide grid medium, forming a metal layer of a source electrode and a drain electrode at two ends of the graphene nano-belt, obtaining a back grid structure with the substrate as a grid, where the width of the nano-band is 1-5 nm. The substrate is a silicon chip, the oxide grid medium is the silicon oxide layer obtained by thermally oxidizing and growing on the silicon chip. USE - Preparation method of FET based on narrow graphene nano-belt (claimed) used in active matrix display and logic circuit. Can also be used in integrated circuit (IC). ADVANTAGE - The prepared graphene nano-belt has a very narrow width so that belt has a large band gap, so that the prepared FET has high switch ratio, at the same time, the prepared graphene nano-belt has smooth edge to make the prepared FET have high field effect mobility. The preparation method uses microwave heating, transition metal auxiliary hydrogen for melting the single-wall carbon nanotubes, and controls the amount of hydrogen when melting and chain time, so as to form narrow graphene nanotubes with width of 1-5 nm. The needed melting temperature is far lower than the temperature of the tubular furnace pyrolysis chain, and reducing the requirement of the device.