• 专利标题:   Optical element for use with electromagnetic radiation at specific wavelength in ultraviolet, extreme ultraviolet or soft X-ray bands, comprises reflective, transmissive, protective, interdispersed or capping layer coating with materials.
  • 专利号:   US2022155671-A1
  • 发明人:   JAISWAL S
  • 专利权人:   JAISWAL S
  • 国际专利分类:   C01B032/158, C01B032/182, C01B032/20, C01G039/06, G03F001/24, G03F001/48, G03F001/54, G03F007/20, G03F007/30
  • 专利详细信息:   US2022155671-A1 19 May 2022 G03F-001/24 202250 English
  • 申请详细信息:   US2022155671-A1 US098956 16 Nov 2020
  • 优先权号:   US098956

▎ 摘  要

NOVELTY - The optical element comprises a reflective, transmissive, protective, interdispersed or capping layer coating, where the coating is provided with the materials (316). The material is provided as a monatomic material, such as graphene, graphite, molybdenum sulfide or carbon nanotubes. The reflective coating is provided as a multilayer, where the material is provided as graphene. The transmissive coating or layer has a material in a form of graphene, where the specific wavelength of the optical element is provided at a target wavelength of 13.5 nanometers. USE - Optical element for use with the electromagnetic radiation at a specific wavelength in ultraviolet, extreme ultraviolet or soft X-ray bands. Uses include but are not limited to a photolithography tool, biotechnology system, scanning or imaging system, astronomical system, material processing system or printing system. ADVANTAGE - The method enables the overall lithography system to operate at a lower power, and generates the less heat. The optical elements made with this material exhibit superior reflectivity with the reduced absorption. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a method for fabricating a material to reflect, absorb or transmit electromagnetic radiation at a specific wavelength in the ultraviolet, extreme ultraviolet or soft X-ray bands. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of a photolithography mask with a material. Photolithography mask (300) Mask top layer (310) Three-dimensional arrays (312,314) Material (316) Mask bottom layer (318)