• 专利标题:   Method for preparing material surface nano-particle by laser, involves placing substrate on mobile platform of vacuum chamber, performing irradiation of single-emitting or multi-emission laser pulse at same position of substrate, and forming compact nano particle in ablative region of substrate.
  • 专利号:   CN114751649-A
  • 发明人:   ZHAO Y, ZHAO D, CUI H
  • 专利权人:   HARBIN INST TECHNOLOGY
  • 国际专利分类:   B82Y040/00, C03C015/00
  • 专利详细信息:   CN114751649-A 15 Jul 2022 C03C-015/00 202273 Chinese
  • 申请详细信息:   CN114751649-A CN10440082 25 Apr 2022
  • 优先权号:   CN10440082

▎ 摘  要

NOVELTY - The method comprises (i) placing a substrate on a mobile platform of a vacuum chamber, providing the substrate with a single-layer graphene, (ii) discharging an electrode ultraviolet laser using a focused pulse width of 1.6ns to burn the substrate, where the laser wavelength is 46.9 nm, the laser is reflected and focused by a super-ring surface mirror, the super ring surface mirror is not coated, performing the irradiation of single-emitting or multi-emission laser pulse at the same position of the substrate and (iii) forming a compact nano particle in the ablative region of the substrate, where the substrate is a glass substrate. USE - The method is useful for preparing material surface nano-particle by laser, where the material surface particle is useful in material surface particles preparation field. ADVANTAGE - The height of the nano-particles is reduced as the number of times of laser ablation is increased. The nano particles are distributed in the ablation area controlled by focusing extreme ultraviolet lithography (EUV) laser energy distribution, in the interaction process, because 3% of the laser energy is absorbed by the single layer of graphene, this special surface behavior is caused. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of the nano-particles in the ablation area.