• 专利标题:   Ferroferric oxide/reducing oxidation graphene composite absorbing material of hollow hemisphere structure comprises composite absorbing material of multilayer composite structure.
  • 专利号:   CN102533216-A, CN102533216-B
  • 发明人:   BI H, SUN J, YUAN Y, XU H
  • 专利权人:   UNIV ANHUI, HEFEI CTRONLOGY CO LTD
  • 国际专利分类:   C09K003/00
  • 专利详细信息:   CN102533216-A 04 Jul 2012 C09K-003/00 201312 Chinese
  • 申请详细信息:   CN102533216-A CN10441684 27 Dec 2011
  • 优先权号:   CN10441684

▎ 摘  要

NOVELTY - A ferroferric oxide/reducing oxidation graphene composite absorbing material of hollow hemisphere structure comprises composite absorbing material of multilayer composite structure with nano thickness formed by ferroferric oxide nanoparticles of hollow hemisphere structure uniformly growing on upper and lower surfaces of reducing oxidation graphene sheet, with thickness of less than skin depth of ferro magnetic material in microwave frequency band of 100 nm-1 mu m. USE - Ferroferric oxide/reducing oxidation graphene composite absorbing material of hollow hemisphere structure. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a preparation of composite wave-absorbing material comprising processing ultrasonic dispersion with (pts.wt.) graphene oxide (0.01-2), surfactant P123 and/or F127 (0.1-1) into solvent (50-100), with solvent comprising ethylene, ethyl alcohol and water; adding (pts.wt.) soluble ferric salt (1-3) and soluble organic salt (1-4) to solution, quickly stirring for 60-120 minutes, and obtaining uniformly distributed solution; shifting mixed solution to stainless steel reaction kettle, screwing hermetically, and putting in air dry oven to maintain constant temperature for 3-12 hours at 180-200 degrees C; and leaching product, washing with distilled water and absolute ethyl alcohol sequentially, and vacuum drying for 8-12 hours at 70-90 degrees C.