▎ 摘　　要

NOVELTY - The blank mask (100) has a metal film (104) and a heat-radiating film (106) that is provided on a transparent substrate (102). The heat-radiating film is composed of a material having an emissivity value of 0.6 to 1. The heat-radiating film is composed of one of a carbon compound including graphene or boron carbide, and a silicon compound containing carbon and nitrogen. The heat-radiating film is provided with a thickness of 1 nm to 10 nm. USE - Blank mask used for preparing multi-electron beam lithography photomask (claimed). ADVANTAGE - The blank mask for multiple electron beam lithography prevents pattern defects in manufacturing a photomask, as the heat radiation film is provided on transparent substrate. Thus, the heat resistance is improved even in an irradiation process using multiple electron beams, and the productivity is improved by using the multi-electron beam irradiation process. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a multi-electron beam lithography photomask. DESCRIPTION OF DRAWING(S) - The drawing shows a cross-sectional view of the blank-mask used for multi-electron beam lithography photomask. Blank mask (100) Transparent substrate (102) Metal film (104) Heat-radiating film (106) Resist film (108)