▎ 摘　　要

NOVELTY - Apparatus (10) comprises a chamber (100), a stage in the chamber, and a dielectric window (120) including a first surface facing the stage and a second surface provided on a side opposite to the first surface. A planar high-frequency antenna is formed on the second surface of the dielectric window. A first gas nozzle is configured to provide a source gas into the chamber, where an alternating current electric signal having a frequency of 1 MHz to 1 GHz is applied to the planar high-frequency antenna. USE - Apparatus for depositing a two-dimensional material. ADVANTAGE - The apparatus increases deposition uniformity, prevents a dielectric window from being contaminated, and form a high-quality deposition film. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic cross-sectional view of the apparatus for depositing a two-dimensional material. 10Apparatus 21Vacuum pump 100Chamber 120Dielectric window 130Gas storage