▎ 摘　　要

NOVELTY - Producing two-dimensional autonomous nanostructures using system in an environment of plasma excited by microwaves, and injecting a mixture of gasses and precursors, in the drainage regime and reactor. The drainage is submitted to the electric field of a surface wave, excited by the power use microwave that is introduced in a field applicer. The plasms are generated with high density energy, which breakdown the precursors into their constituents atomic and/or molecular. The system comprises plasma reactor with launch zone of surface waves, transient zone with progressive growing cross section area. The reactor of plasma is together with a source of infrared radiation, and provide an adjustment controlled of the space gradients of temperature and speed of output of the gas. The nanostructure samples obtained are two-dimensional and has a single layer thickness atomic. USE - Method for producing two-dimensional autonomous nanostructures using system in an environment of plasma excited by microwaves. ADVANTAGE - The method allows to produce two-dimensional autonomous nanostructures by using system allows to obtain production rates of graphene in the order of one gram per hour and upper.