• 专利标题:   Formation of graphene used in fabrication of e.g. transistor, involves obtaining patterned organic material monolayer, and supplying thermal energy in amount required for carbonizing monolayer and forming patterned layer of graphene.
  • 专利号:   US2015175427-A1, US9561964-B2
  • 发明人:   JAHANGIRIFAMENINI H
  • 专利权人:   JAHANGIRIFAMENINI H, JAHANGIRIFAMENINI H
  • 国际专利分类:   B23K026/36, C01B031/04, B82Y030/00, B82Y040/00
  • 专利详细信息:   US2015175427-A1 25 Jun 2015 C01B-031/04 201547 Pages: 14 English
  • 申请详细信息:   US2015175427-A1 US641271 06 Mar 2015
  • 优先权号:   US398332P, US641271

▎ 摘  要

NOVELTY - Formation of graphene involves patterning an organic material monolayer provided on a primary substrate (22), obtaining patterned organic material monolayer (30), and supplying thermal energy to patterned organic material monolayer. The thermal energy is supplied in an amount required for carbonizing monolayer and forming a patterned layer of graphene on the substrate. USE - Formation of graphene used in fabrication of transistor, conductive plate of ultracapacitor, and transparent electrode for touchscreen of liquid crystal display, organic photovoltaic cell, and organic light-emitting diode. ADVANTAGE - The method enables efficient formation of graphene with excellent electroconductivity and optical transparency. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for the following: (1) method for reducing evaporation of organic material monolayer provided on substrate, which involves cooling the substrate during supply of energy to a portion of the organic material monolayer, placing the substrate in an environment having an elevated atmospheric pressure during supplying of energy to the portion of the organic material monolayer, and reducing evaporation of organic material monolayer during carbonization; and (2) fabrication of patterned organic material monolayer, which involves obtaining patterned organic material monolayer by exposing a portion of the organic material monolayer to a localized energy beam (34) in an amount required for evaporating or ablating the exposed portion of the organic material monolayer. DESCRIPTION OF DRAWING(S) - The drawing shows the schematic view of the apparatus for forming patterned organic material monolayer. Apparatus (20) Primary substrate (22) Energy source (26) Patterned organic material monolayer (30) Energy beam (34)