▎ 摘　　要

NOVELTY - The graphene structure has an upper layer that is provided with an amorphous carbon film and a lower layer that is provided with a multilayer graphene film. The thickness of the multilayer graphene film is 0.5-10 nm. The amorphous carbon and multilayer graphene films are formed on a substrate made of silicon or glass. USE - Graphene structure used in high power pulse magnetron sputtering preparation. ADVANTAGE - Environment-friendly graphene can be attained effectively. The requirement of catalyst for preparing the graphene structure can be avoided so that the cost required for the graphene structure preparation can be reduced. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for the preparation method of graphene structure. DESCRIPTION OF DRAWING(S) - The drawing shows an explanatory view illustrating the preparation method of graphene structure.