• 专利标题:   Method for transferring of graphene patterned film by gas-liquid interface separation process, involves forming graphene oxide solution on substrate, reducing by chemical reducing agent, tilting substrate with graphene patterned film.
  • 专利号:   CN107915220-A
  • 发明人:   PEI Z, YANG C, ZHU C
  • 专利权人:   HEFEI GUOXUAN HIGH TECH POWER SOURCE CO
  • 国际专利分类:   C01B032/184, C01B032/194
  • 专利详细信息:   CN107915220-A 17 Apr 2018 C01B-032/194 201831 Pages: 5 Chinese
  • 申请详细信息:   CN107915220-A CN11153336 17 Nov 2017
  • 优先权号:   CN11153336

▎ 摘  要

NOVELTY - The method for transferring graphene patterned film by gas-liquid interface separation process, involves forming graphene oxide solution on substrate (I) as graphene oxide patterned film, reducing by chemical reducing agent, tilting substrate (I) with graphene patterned film, slowly detaching the graphene patterned film from the surface of substrate (I), and floating on the gas-liquid interface, using the substrate (II) to obliquely insert underneath the graphene patterned film, slowly removing the graphene patterned film and transferring to substrate (II). USE - Method for transferring of graphene patterned film by gas-liquid interface separation process. ADVANTAGE - The method enables transferring of graphene patterned film with high stability. DETAILED DESCRIPTION - Method for transferring graphene patterned film by gas-liquid interface separation process, involves (1) forming graphene oxide solution on substrate (I) as graphene oxide patterned film, reducing by chemical reducing agent, reducing the graphene oxide patterned film to graphene patterned film, (2) tilting substrate (I) with graphene patterned film, and slowly into water, slowly detaching the graphene patterned film from the surface of substrate (I) and floating on the gas-liquid interface, (3) using the substrate (II) to obliquely insert underneath the graphene patterned film, slowly removing the graphene patterned film and transferring to substrate (II).