• 专利标题:   Manufacture of nanopattern-containing graphene involves forming nanobead layer on oxide graphene layer, separating gap between nanobeads, forming metallic layer on oxide graphene layer, and forming nanopattern by etching graphene layer.
  • 专利号:   KR2013136086-A
  • 发明人:   BYUN N, LEE D, LEE S, SEO B
  • 专利权人:   LG ELECTRONICS INC
  • 国际专利分类:   B82B003/00, C01B031/02, H01B001/06
  • 专利详细信息:   KR2013136086-A 12 Dec 2013 C01B-031/02 201403 Pages: 11
  • 申请详细信息:   KR2013136086-A KR059646 04 Jun 2012
  • 优先权号:   KR059646

▎ 摘  要

NOVELTY - Manufacture of nanopattern-containing graphene involves oxide graphene layer on substrate, forming nanobead layer on oxide graphene layer, separating gap between nanobeads, forming metallic layer on oxide graphene layer using nanobead as mask, removing nanobead, forming nanopattern by etching oxide graphene layer using metallic layer as mask, and removing the metallic layer. USE - Manufacture of nanopattern-containing graphene (claimed).