▎ 摘　　要

NOVELTY - The method involves providing metal layer (20) on a first surface of a first substrate. A graphene (30) on the side opposite to the first substrate is grown. A resist layer (40) is formed on a side opposite to the metal layer. A pattern is formed on the resist layer by imprint. The graphene is etched using the resist layer on which the pattern is formed as a mask. The pattern for forming an antidot is formed in which a carbon atom is deleted in the graphene by the imprint. The graphene is etched. The metal layer is removed and the graphene held by the resist layer is separated from the first substrate. The graphene held by the resist layer is transferred to the second surface of the second substrate. USE - Manufacturing method of graphene optical sensor. ADVANTAGE - The light absorption efficiency of the graphene is enhanced, by the surface plasmon excitation is performed for the purpose of high sensitivity. The influence of the step of the graphene and the resist layer or the influence of the non-uniform film thickness of the resist layer is suppressed. The time required for obtaining the graphene having the antidot is shortened. The manufacturing efficiency of the graphene optical sensor and the mass-productivity are enhanced. The graphene optical sensor including the graphene having antidot is efficiently manufactured by eliminating the need for EB lithography. The formation of wrinkles and cracks in the graphene is effective in realizing the graphene optical sensor of high performance. DESCRIPTION OF DRAWING(S) - The drawing shows a cross sectional view of a graphene optical sensor. (Drawing includes non-English language text) 10Substrate 20Metal layer 30Graphene 40Resist layer 41Opening