▎ 摘　　要

NOVELTY - Graphene deposition device (100) comprises a titanium deposition unit (110) for depositing a titanium layer on one surface of the substrate; a multiple of graphene forming units (121-126) receiving the substrate and forming a graphene layer on the titanium layer; and a transfer unit (130) for selectively transferring the substrate from the titanium deposition unit to the multiple of graphene forming units, where the process of the titanium deposition unit is made shorter in time than the process of the graphene forming unit, and a multiple of the graphene forming units are formed for dividing and supplying the substrate discharged from the titanium deposition unit into a multiple of graphene forming units in turn according to the temporal progression order, and the transfer unit is set in a temporal progression sequence. A vibrating unit is connected to mesh structure of gate valve and generating vibration to remove carbon particles from mesh structure. USE - Used as graphene deposition device. ADVANTAGE - The device improves productivity of high-quality graphene by reducing the process time by dividing the graphene synthesis into a multiple of chambers. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic representation of the graphene deposition device. Graphene deposition device (100) Titanium deposition unit (110) Graphene forming units (121-126) Transfer unit (130)