• 专利标题:   Preparing flexible film based on graphene micro-cylinder array involves constructing poly-di-methyl-siloxane (PDMS) substrate with micro cylinder array having certain height and aspect ratio, anm placing PDMS with microarray in plasma.
  • 专利号:   CN107556508-A
  • 发明人:   LIU A, QIAN W, WU H, LI M
  • 专利权人:   UNIV ZHEJIANG SCI TECH
  • 国际专利分类:   C08J007/06
  • 专利详细信息:   CN107556508-A 09 Jan 2018 C08J-007/06 201811 Pages: 11 Chinese
  • 申请详细信息:   CN107556508-A CN10770399 31 Aug 2017
  • 优先权号:   CN10770399

▎ 摘  要

NOVELTY - Preparing flexible film based on graphene micro-cylinder array involves constructing poly-di-methyl-siloxane (PDMS) substrate with micro cylinder array having height of 20 micrometer and aspect ratio of 1-2.5. The PDMS with the microarray is placed in a plasma etch apparatus, treated with plasma oxygen for 10-15 minutes, and PDMS is soaked in PDDA solution (polydienedimethylammonium chloride solution) for 30-60 minutes, then washed with deionized water, and placed in an oven at 40 degrees C for drying. USE - Method for preparing flexible film based on graphene micro-cylinder array (claimed). ADVANTAGE - The method enables to prepare flexible film based on graphene micro-cylinder array in simple and cost-effective manner, and which has high repeatability. DETAILED DESCRIPTION - Preparing flexible film based on graphene micro-cylinder array involves constructing poly-di-methyl-siloxane (PDMS) substrate with micro cylinder array having height of 20 micrometer and aspect ratio of 1-2.5. The PDMS with the microarray is placed in a plasma etch apparatus, treated with plasma oxygen for 10-15 minutes, and PDMS is soaked in PDDA solution (polydienedimethylammonium chloride solution) for 30-60 minutes, then washed with deionized water, and placed in an oven at 40 degrees C for drying. The graphene solution of 0.3 milligram/milliliter is dropped in the dropping the amount of 200-467 microliter/centiometer square, and drying at 40 degrees C to obtain final product.