• 专利标题:   Preparing thermal interface material based on high-density graphene interconnection network structure by placing copper powder in quartz mold, introducing reaction gas to grow grapheme, removing copper frame by etching, forming and cutting.
  • 专利号:   CN112457826-A
  • 发明人:   ZHANG L, WANG X, YE Q, WANG W
  • 专利权人:   HANGZHOU YINGXIJIE TECHNOLOGY CO LTD
  • 国际专利分类:   C09K005/14
  • 专利详细信息:   CN112457826-A 09 Mar 2021 C09K-005/14 202128 Pages: 11 Chinese
  • 申请详细信息:   CN112457826-A CN11545541 24 Dec 2020
  • 优先权号:   CN11545541

▎ 摘  要

NOVELTY - Method for preparing thermal interface material based on high-density graphene interconnection network structure involves placing copper powder with a particle size of 5-50 mu m in a quartz mold of a certain shape, introducing reaction gas to grow graphene at a certain temperature through the chemical vapor deposition method, removing copper frame by etching means after growth to obtain graphene interconnection network structure, forming graphene/polymer composite material through glue filling process, and cutting off the surface portion to expose graphene to obtain the product. USE - The method is useful for preparing thermal interface material based on high-density graphene interconnection network structure. ADVANTAGE - The method simply grows the graphene network in one step through copper powder and etches away the foamed copper structure formed by the copper powder to obtain a sponge-like graphene interconnection network skeleton with high density and high thermal conductivity, and improves the mechanical strength and robustness of use through composite processing with polymers. The material is economical, and has low defect and high thermal conductivity.