▎ 摘　　要

NOVELTY - Method for depositing a nanoscale-thin film in a preselected area on a substrate, involves (a) depositing a layer of a functionalizing molecule onto or adjacent to a first surface of the substrate, (b) functionalizing the first surface of the substrate by focusing a source of ionizing radiation onto the layer of the functionalizing molecule, (c) removing the layer of the functionalizing molecule, and (d) depositing the nanoscale-thin film onto the functionalized first surface of the substrate, where the functionalizing molecule is in a solid or gaseous state. The step (c) involves warming the substrate above the melting point of water or submerging the water in a wash solution. USE - The method is useful for depositing a nanoscale-thin film in a preselected area on a substrate. ADVANTAGE - The film has improved mechanical, optical and electrical properties. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a method of functionalizing a preselected area on a substrate.