• 专利标题:   Method for preparing porous graphene film, involves preparing porous alpha-aluminum oxide matrix by colloidal filtration method, and preparing gadolinium-doped cerium oxide, followed by introducing pores into graphene skeleton.
  • 专利号:   CN108568218-A
  • 发明人:   FAN R, YAN K, LIU Y, ZHANG Z
  • 专利权人:   SUZHOU MAIERTE MATERIALS TECHNOLOGY CO
  • 国际专利分类:   B01D071/02, B01D067/00, B01D053/22
  • 专利详细信息:   CN108568218-A 25 Sep 2018 B01D-071/02 201870 Pages: 8 Chinese
  • 申请详细信息:   CN108568218-A CN10147370 13 Mar 2017
  • 优先权号:   CN10147370

▎ 摘  要

NOVELTY - A porous graphene film preparing method involves preparing a porous alpha-aluminum oxide matrix by colloidal filtration method, preparing a nanoparticle sol precursor of gadolinium-doped cerium oxide by ultrasonic chemical precipitation, depositing a layer of cerium-gadolinium-oxygen gadolinium-doped cerium oxide precursor film on the porous alpha-aluminum oxide substrate, and preparing a gadolinium doped cerium oxide buffer layer by drying and rapid annealing, applying different concentrations of graphene oxide suspension to the alpha-aluminum oxide supported gadolinium doped cerium oxide buffer layer by spin coating process, using an hydrogen atmosphere thermal reduction process to remove the oxygen-containing functional groups on the graphene oxide, and introducing the pores into the graphene skeleton to obtain the finished product. USE - Method for preparing porous graphene film. ADVANTAGE - The method enables preparing porous graphene film with excellent market prospect, better chemical stability, better mechanical performance and separation performance. DETAILED DESCRIPTION - A porous graphene film preparing method involves preparing a porous alpha-aluminum oxide matrix by colloidal filtration method, preparing a nanoparticle sol precursor of gadolinium-doped cerium oxide by ultrasonic chemical precipitation, depositing a layer of cerium-gadolinium-oxygen (Ce(0.9)Gd(0.1)O(1.95)) gadolinium-doped cerium oxide precursor film on the porous alpha-aluminum oxide substrate, and preparing a gadolinium doped cerium oxide buffer layer by drying and rapid annealing, applying different concentrations of graphene oxide suspension to the alpha-aluminum oxide supported gadolinium doped cerium oxide buffer layer by spin coating process, using an hydrogen atmosphere thermal reduction process to remove the oxygen-containing functional groups on the graphene oxide, and introducing the pores into the graphene skeleton to obtain the finished product.