• 专利标题:   Light emitting device, has carbon layer provided with graphene, and light emitting structure layer arranged on thin film layer, where light emitting structure layer is made of n-type semiconductor layer and p-type semiconductor layer.
  • 专利号:   WO2012047069-A2, KR2012036131-A, WO2012047069-A3, KR1217210-B1, US2013187127-A1, US9166101-B2
  • 发明人:   YI G, CHUNG K, LEE C, YI G C, CHUNG K O, LEE C H
  • 专利权人:   SNU R DB FOUND, SNU R DB FOUND
  • 国际专利分类:   H01L033/04, H01L033/16, H01L033/20, H01L033/06, H01L021/00, H01L027/15, H01L029/18, H01L033/00, H01L033/40, H01L033/42
  • 专利详细信息:   WO2012047069-A2 12 Apr 2012 H01L-033/04 201227 Pages: 24
  • 申请详细信息:   WO2012047069-A2 WOKR007461 07 Oct 2011
  • 优先权号:   KR097842

▎ 摘  要

NOVELTY - The device (1) has a carbon layer (20) provided with a graphene. Multiple microstructures (30) are grown up in an upper side of a carbon layer. A thin film layer (42) is arranged in the microstructures. A light emitting structure layer (40) is arranged on the thin film layer, where the light emitting structure layer is made of a n-type semiconductor layer and a p-type semiconductor layer (46). An electrode layer is formed on the light emitting structure layer. A substrate (10) is positioned in a lower part of the carbon layer. Another electrode layer is formed on a surface of the carbon layer. USE - Light emitting device. ADVANTAGE - The micro-structure has better crystallization, so that the device has better electrical property and optical property. The superior quality thin films are formed on the micro-structure, so that the device has high efficiency and better conductivity. The device is provided with the graphene, so that the performance degradation of the device is prevented. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a light emitting device manufacturing method. DESCRIPTION OF DRAWING(S) - The drawing shows a side view of a light emitting device. Light emitting device (1) Substrate (10) Carbon layer (20) Microstructures (30) Light emitting structure layer (40) Thin film layer (42) P-type semiconductor layer (46)