• 专利标题:   Method for manufacturing metal-based flexible electrode, involves transferring graphene onto donor substrate, where photoresist pattern is formed on graphene by photolithography process.
  • 专利号:   KR2022134975-A
  • 发明人:   SUNG P H, SEO J H, CHUNG K
  • 专利权人:   UNIST ULSAN NAT SCI TECHNOLOGY INST
  • 国际专利分类:   G03F007/16, G03F007/20, G03F007/26, H01B013/00, H01B005/14
  • 专利详细信息:   KR2022134975-A 06 Oct 2022 H01B-013/00 202287 Pages: 23
  • 申请详细信息:   KR2022134975-A KR040342 29 Mar 2021
  • 优先权号:   KR040342

▎ 摘  要

NOVELTY - The method involves (i) transferring a graphene onto a donor substrate; (ii) forming a photoresist pattern on the graphene by a photolithography process; (iii) depositing a metal on the photoresist pattern and removing the photoresist pattern to form a metal pattern; (iv) coating a polymer precursor on a metal pattern and curing it to form a polymer layer, and obtaining a donor substrate-graphene-metal pattern-polymer laminate; and (v) peeling a donor substrate from the donor substrate-graphene-metal pattern-polymer laminate. USE - The method is useful for manufacturing metal-based flexible electrode (Claimed). ADVANTAGE - The method enables manufacture of metal-based flexible electrode having excellent electrical conductivity, optical transmittance, chemical stability, mechanical stability and mechanical durability. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a flexible electronic device. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic representation of the manufacturing metal-based flexible electrode.