• 专利标题:   Preparing bismuth oxyiodide/reduced graphene oxide binary composite material, involves using bismuth nitrate pentahydrate and potassium iodide as precursors, using water as solvent, adding reduced graphene oxide ethanol ultrasonic dispersion, and then undergoes hydrothermal preparation.
  • 专利号:   CN114618558-A
  • 发明人:   WU Y, ZHANG Y, LI Z, ZHANG M, WANG J, SUN J, YAO R, LI J, LV J, DU Y, CAO H, BAO Z
  • 专利权人:   UNIV HEFEI TECHNOLOGY
  • 国际专利分类:   B01J027/24, B01J037/10, C02F001/30, C02F101/30
  • 专利详细信息:   CN114618558-A 14 Jun 2022 B01J-027/24 202295 Chinese
  • 申请详细信息:   CN114618558-A CN10410540 19 Apr 2022
  • 优先权号:   CN10410540

▎ 摘  要

NOVELTY - Preparing bismuth oxyiodide (BiOI)/reduced graphene oxide (RGO) binary composite material, involves using bismuth nitrate pentahydrate (Bi(NO3)3.5H2O) and potassium iodide (KI) as precursors, using water as solvent, adding RGO ethanol ultrasonic dispersion, and then undergoes hydrothermal preparation to obtain BiOI/RGO binary composites. USE - Method for preparing bismuth oxyiodide/reduced graphene oxide binary composite material. ADVANTAGE - The composite material has good chemical stability, strong catalytic activity, simple and mature preparation method and cost-effective. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a method for preparing BiOI/RGO/g-C3 N4 composite photocatalyst, which involves: preparing layered g-C3N4, and dispersing graphitic carbon nitride (g-C3N4) in ethanol to obtain a g-C3N4 dispersion. The g-C3N4 dispersion liquid and BiOI/RGO binary composite material are mixed, hydrothermally reacted, filtered, centrifuged, washed, dried and ground to obtain a BiOI/RGO/g-C3N4 composite photocatalyst.