• 专利标题:   Wear-resistant and oxygen-resistant material useful in e.g. artificial bone joint material, bone screw, bone cerclage material, body wearables, medical packaging and dpipeline transportation, comprises ultra-high molecular weight polyethylene, resveratrol, and e.g. calcium carbonate, or glass fiber.
  • 专利号:   CN114058102-A, CN114058102-B
  • 发明人:   FU Q, ZHANG Q, DONG P, WANG K
  • 专利权人:   UNIV SICHUAN
  • 国际专利分类:   C08K005/13, C08L023/06
  • 专利详细信息:   CN114058102-A 18 Feb 2022 C08L-023/06 202232 Chinese
  • 申请详细信息:   CN114058102-A CN11343220 13 Nov 2021
  • 优先权号:   CN11343220

▎ 摘  要

NOVELTY - Wear-resistant and oxygen-resistant material comprises 95-99.99 pts. wt. ultra-high molecular weight polyethylene, and 0.01-5 pts. wt. resveratrol. USE - The material is useful in artificial bone joint material, bone screw, bone cerclage material, bone fixation materials related to orthopedic surgery, body wearables, medical packaging, pipeline transportation, or lining of wear parts (claimed). ADVANTAGE - The material has oxidation induction time of 30-70 minutes in a pure oxygen atmosphere at 200degrees Celsius, volume wear of 4-9x10-4 mm3/Nm after 5000 times of reciprocating friction, and a friction coefficient of 0.053-0.056, has both excellent anti-oxidation performance and wear-resistant performance, and good mechanical performance of the material. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are also included for: (1) a method for preparing wear-resistant and oxygen-resistant material, comprising uniformly mixing resveratrol and ultra-high molecular weight polyethylene to obtain a resveratrol/ultra-high molecular weight polyethylene compound, and forming compound into a wear-resistant and oxygen-resistant material; (2) a method for improving the wear resistance of ultra-high molecular weight polyethylene, comprising adding resveratrol into the ultra-high molecular weight and mixing to obtain resveratrol/ultra-high molecular weight polyethylene compound, and molding the compound and irradiating by placing the formed compound in an irradiation source for high-energy ray irradiation, where the irradiation source used is gamma rays or electron beams, the irradiation dose rate is 5-200 kGy/h, and the irradiation dose is 50-150 kGy.