▎ 摘　　要

NOVELTY - Preparing patterned graphene on the transparent light base comprises (a) covering film on the light permeable substrate, so that the laser light from the light on the base of the upper or lower side of the incident, focusing on the film, where the power density of the laser focus reaches more than 10 W/mm2, and (b) controlling the laser focus relative film movement along the preset track so that the film decomposition and depositing a graphene pattern on the transparent light base, where the film is polyimide film, polyetherimide film, graphite film or graphene oxide film. USE - The method is useful for preparing patterned graphene on the transparent light base (claimed). ADVANTAGE - The patterned graphene has simple operation, is economical, improve photovoltaic performance of transparent substrate for correlation of the graphene device.