▎ 摘　　要

NOVELTY - A two-dimensional graphene film nano-grid electron beam writing substrate conductivity improving method involves preparing graphene-copper metal substrate, spin-coating on polymethyl methacrylate or methyl methacrylate, etching and washing with deionized water to obtain clean sample. The obtained sample is transferred into target substrate, immersed into organic solution, cleaned and performed electron beam exposure and development, followed by removing exposed electron beam exposure pattern graphene, peeling grate material and removing residual graphene by using oxygen plasma. USE - Method for improving two-dimensional graphene film nano-grid electron beam writing substrate conductivity. ADVANTAGE - The method enables improving substrate conductivity with high conductivity, high precision and better adhesion resistance property. DETAILED DESCRIPTION - A two-dimensional graphene film nano-grid electron beam writing substrate conductivity improving method involves preparing graphene-copper metal substrate by using chemical vapor deposition process, spin-coating on polymethyl methacrylate or methyl methacrylate, etching by using etching liquid, allowing to stand and washing with deionized water to obtain clean sample. The obtained sample is transferred into target substrate, immersed into organic solution, cleaned with deionized water and performed electron beam exposure and development, followed by removing exposed electron beam exposure pattern graphene, peeling grate material and removing residual graphene by using oxygen plasma.