• 专利标题:   Measuring manganese, silicon and potassium in graphene oxide by heating graphene oxide in electric furnace, firing to obtain residual oxide, dissolving oxide in mixed solution of hydrochloric acid and hydrofluoric acid and treating.
  • 专利号:   CN108519370-A
  • 发明人:   WANG L, GENG X, YANG C, MENG Y, GAO S
  • 专利权人:   AECC BEIJING AERONAUTICAL MATERIALS INST
  • 国际专利分类:   G01N021/73, G01N001/44, G01N001/28, G01N001/34
  • 专利详细信息:   CN108519370-A 11 Sep 2018 G01N-021/73 201876 Pages: 14 Chinese
  • 申请详细信息:   CN108519370-A CN10413315 02 May 2018
  • 优先权号:   CN10413315

▎ 摘  要

NOVELTY - The method for measuring manganese, silicon and potassium in graphene oxide involves using a platinum crucible as a container, heating graphene oxide in an electric furnace at 400 degrees C and firing at 1000 plus minus 50 degrees C in a muffle furnace for removing carbon matrix to obtain a residual oxide, dissolving oxide in 20:1 mixed solution of hydrochloric acid and hydrofluoric acid, treating to obtain transparent and clear dissolved sample and carrying out measurement at a high-frequency incident power of 0.9 kW using an inductively coupled plasma spectrometer and 257.610 nm manganese, 251.611 nm silicon and 766.468 nm potassium as analysis line. USE - Method is useful for measuring manganese, silicon and potassium in graphene oxide. ADVANTAGE - The method enables accurate, stable, rapid and simple measurement of manganese, silicon and potassium in graphene oxide with high repeatability, and saves a lot of manpower and material resources.